1 August 1990 Interference pattern processing technique for optical phase measurement with applications in precision surface metrology
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Proceedings Volume 1266, In-Process Optical Measurements and Industrial Methods; (1990) https://doi.org/10.1117/12.20269
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Abstract
A signal processing method is proposed for optical nhase measurement from spatial carrier frequency interference fringe pattern. The intensity model of the interference pattern is adapted to the measured intensity array of the interferogram using a parameter-adaptive estimation algorithm to identify the model parameters. The algorithm is implemented in a digital interferogram analysing system for applications in precision surface microprofilometry and roughness measurements. 1.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
W. Tischer, W. Tischer, } "Interference pattern processing technique for optical phase measurement with applications in precision surface metrology", Proc. SPIE 1266, In-Process Optical Measurements and Industrial Methods, (1 August 1990); doi: 10.1117/12.20269; https://doi.org/10.1117/12.20269
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