1 August 1990 Measurement of surface quality using a moire deflectometer
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Proceedings Volume 1266, In-Process Optical Measurements and Industrial Methods; (1990) https://doi.org/10.1117/12.20279
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
The ability of moire deflectometry to measure surface quality is compared to other optical probes. The comparison is done using the amplitude - wavelength (A - W) diagrams introduced by Stedman. Two modes of analysis allow the extension of the amplitude and wavelength ranges over many orders of magnitude. In the flatness mode, the actual profile is calculated from the fringe slopes using an adaptation of the phase shift method. The range of amplitudes covered by this mode is from around A = 100 nm (at wavelengths down to 50 jim) to over 100 jim at W = 50mm. In the roughness mode the autocovariance function is calculated from measurements of fringe contrast versus sensitivity (or shear) of the instrument. Resolution extends to several nanometers of amplitude and a few microns in wavelength. The tunable sensitivity of the moire deflectometer allows a considerable overlap between the flatness and the roughness modes of operation. Both fringe shifts and contrast are measured from the same deflectogram thus yielding a dynamic range much wider than those of other optical methods. The above figures refer to the Rotlex Optics OMS -400 which is a general purpose instrument. The A -Wranges may be extended in certain directions by building more specialized instruments based on the same technique. However, such extensions may reduce the range in other portions ofthe A -W space. The method is demonstrated using various types of surfaces.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eliezer Keren, Eliezer Keren, Kathi Kreske, Kathi Kreske, Amiadav Livnat, Amiadav Livnat, } "Measurement of surface quality using a moire deflectometer", Proc. SPIE 1266, In-Process Optical Measurements and Industrial Methods, (1 August 1990); doi: 10.1117/12.20279; https://doi.org/10.1117/12.20279

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