1 August 1990 Sensitivity enhancement in speckle metrology
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Proceedings Volume 1266, In-Process Optical Measurements and Industrial Methods; (1990) https://doi.org/10.1117/12.20278
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Abstract
Sensitivity in speckle metrology is interpreted in the terms of the spatial frequency which is encoded in the double-exposure specklegram. The spatial frequency distribution in specklegrams depends on the character of the object surface and on the configuration of the recording system. Optimization of the optical transfer function of the recording system and treatment of the sample surface so as to broaden the spatial frequency bandwidth are two key approaches for sensitivity enhancement. The objective speckle method offers a capability for accurate optical recording of the specimen surface details. Finely polishing an object surface and replication of a high frequency grating onto the specimen surface yields a fully defined high frequency spectrum. Experimental results demonstrate that the sensitivity of speckle metrology can be controlled within wide margins from values typical of geometric moire to those comparable to moire interferometry. 1.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Meirong Tu, Meirong Tu, Peter J. Gielisse, Peter J. Gielisse, } "Sensitivity enhancement in speckle metrology", Proc. SPIE 1266, In-Process Optical Measurements and Industrial Methods, (1 August 1990); doi: 10.1117/12.20278; https://doi.org/10.1117/12.20278
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