First Contact (FC) Polymer™, developed by Photonic Cleaning Technologies, is used to clean and protect surfaces from contamination. The polymer creates a peelable coating that renders the surface clean while not leaving visible residues. To investigate the effectiveness of FC at the subnanometer level, we used variable-angle, spectroscopic ellipsometry (VASE) to measure sample top-layer thickness after repeated application/storage/removal cycles of standard (red) FC with three sample sets (CVD Si3N4 on Si, bare Si, and SiO2 on Si). The samples were measured via VASE after every FC removal to understand contaminant thickness changes with “peel-off” count. Control samples were also measured at each iteration. Ellipsometric analysis revealed FC removed, during the first peel-off, impurity from the surface of samples treated with impure isopropyl alcohol. Linear regressions and t-tests comparing samples with and without FC were employed for evaluating changes with peel-off counts. There is evidence for the very slight build-up of material which is not removed by iterative FC application/removal cycles on these samples. It is slight, <0.1 nm after 17 iterations, in the case of native oxide on Si.
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