1 August 1990 Femtosecond pulse generation at 193 nm
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Proceedings Volume 1268, Applications of Ultrashort Laser Pulses in Science and Technology; (1990) https://doi.org/10.1117/12.20318
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
A compact excimer-dye laser system is developed for subpicosecond pulse generation at 193 nm. In this setup a double-discharge excimer laser (EMG 150) is used both for pumping the seed-pulse generator and for amplification. The seed-pulse generator is a distributed-feedback dye-laser-based subpicosecond dye laser system, generating a 400 fs pulse at 537 nm and a broadband nanosecond pulse centered at 690 nm. By sending these pulses through a H2 Raman cell in a collinear beam, part of the red pulse is amplified, which coincides with the spectral and temporal gain window of the Raman amplifier pumped by the transform-limited 537-nm pulse. Phase-matched frequency mixing of these Raman-amplified pulses with the frequency-doubled 537-nm pulses results in seed-pulse energies of more than 0.1 jJ at 193 nm, with good spatial, spectral and amplitude stability. By double-pass amplification of the seed pulses in the amplifier section of the EMG 150 excimer laser, typically 0.5 mJ output pulses of -800 fs duration are obtained in a 6 mm diameter circular beam. Additional pulse compression in a prism compressor resulted in significant decrease of the pulse duration to less than 400 fs.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sandor Szatmari, Sandor Szatmari, Fritz P. Schaefer, Fritz P. Schaefer, } "Femtosecond pulse generation at 193 nm", Proc. SPIE 1268, Applications of Ultrashort Laser Pulses in Science and Technology, (1 August 1990); doi: 10.1117/12.20318; https://doi.org/10.1117/12.20318

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