We developed a single-reflective-layer deposition system for the in-house production of x-ray mirrors. The system is based on magnetron sputtering and the linear motion of the substrate. Substrates with lengths up to 500 mm and widths up to 50 mm are processable. In this study, the deposition conditions of Au as a single reflective layer were investigated, assuming an application to a soft x-ray focusing mirror. Under various operating conditions, a 5-nm-thick Cr binder layer was deposited on a (100) Si wafer, followed by a 50-nm-thick Au film, and the surface roughness was evaluated by an atomic force microscope. The surface roughness of the Au film deposited using this system was in the range of 0.5–0.6 nm with no clear dependence on power (50–150 W), base pressure (3.4–5.0 × 10−5 Pa), and Ar flow rate (40–200 sccm).
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