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1 August 1990 Comparison of different technologies for high-quality optical coatings
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Proceedings Volume 1270, Optical Thin Films and Applications; (1990)
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Modern optical systems require still higher quality optical coatings. Conventional production techniques are not able to give such high quality layers. One of the main defaults comes from the relatively porous structure of the thin films; as a consequence the sensitiveness of the materials to the moisture gives noticeably unstable properties versus time. In this work, after a very short review of the different techniques nowaday used to perform high quality optical thin films, we will be especially interested in oxide layer production (Si02, Ta2O5, Ti02). To give a good comparison of the performances obtained with techniques such as TAD and ion plating we need extremely powerful characterization means: - In vacuo measurements of optical properties allowing the study of spontaneous water adsorption during air entrance; - Absorption measurement with photothermal deflection spectroscopy; - Scattering losses measurements and consequently determination of the grain size of the microstructure. Refractive index measurements, and optical anisotropy determined by guided mode study. Finally some views from electron microscopy justify the validity of the model used with our characterization techniques. To end, we will show the interest of ion plating technique when we are looking for very uniform deposition on large surfaces.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francois Flory "Comparison of different technologies for high-quality optical coatings", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990);

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