Dielectric films deposition with cross-section variable thickness for amplitude filters on the basis of frustrated total internal reflection

Svetlana G. Lukishova; Sergej A. Kovtonuk; Anatoly A. Ermakov; Vladimir P. Pashinin; Evgeny E. Plavtov; Alexey S. Svakhin; Aleksandr A. Golubsky

doi:10.1117/12.20384

1 August 1990 Dielectric films deposition with cross-section variable thickness for amplitude filters on the basis of frustrated total internal reflection

Svetlana G. Lukishova, Sergej A. Kovtonuk, Anatoly A. Ermakov, Vladimir P. Pashinin, Evgeny E. Plavtov, Alexey S. Svakhin, Aleksandr A. Golubsky

Author Affiliations +

Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20384
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

Various optical elements with Gaussian and super-Gaussian transmission or ref lection characteristics are used both inside the laser cavities to create a good mode discriminatio?,2and outside them to avoid Fresnel diffraction ripples in beam cross section, e.g. ' (review papers). The frustrated total internal reflection amplitude filter or so-called apodized aperture (FTIR AA) is one of these devices. In this paper we describe the ETIR AA which is a glass cube consisting of two right-angle prisms with their hypothenuse faces near the optical contact, separated by the single dielectric film with smooth monotonous variable thickness along the cross-section. Close to spherical and different smooth flat-top shape surfaces which are Si02, SiO or MgF2 single profiled films with'O.5-1.5pm maximum value of thickness were deposited on glass or quartz substrates by electron beam, reactive heating or sputtering techniques. The comparative analysis of rotating mask and noncontacting mask methods for preparation of profiled films has been carried out. The results of testing of such filters in lasers and laser radiation damage thresholds of films in optical contact conditions are presented herein.

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Svetlana G. Lukishova, Sergej A. Kovtonuk, Anatoly A. Ermakov, Vladimir P. Pashinin, Evgeny E. Plavtov, Alexey S. Svakhin, and Aleksandr A. Golubsky "Dielectric films deposition with cross-section variable thickness for amplitude filters on the basis of frustrated total internal reflection", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20384

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