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1 August 1990 Geometrical limiting performances of a thermal evaporation PVD unit for lens coating
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Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20388
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Abstract
The limiting thickness uniformity attainable for the coating of multiple substrates inside a thermal evaporation physical vapor deposition (PVD) unit is theoretically analyzed. This study compares the classical spherical (dome-shaped) calotte with a plane sectors reversible lens holder setup. This arrangement is very useful for two-sides substrate deposition, such as antireflection coatings on lenses. The design of static correcting shutters for this kind of configuration is also discussed. Some results of this theoretical study are presented.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Salvador Bosch "Geometrical limiting performances of a thermal evaporation PVD unit for lens coating", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20388
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