Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine

Hitomi Betsumiya; Yuqing Jin; Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu

doi:10.1117/12.2687340

21 November 2023 Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine

Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Author Affiliations +

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500J (2023) https://doi.org/10.1117/12.2687340
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

To investigate the development kinetics, this study categorized the dissolution dynamics in tetraalkylammonium hydroxide (TAAH) aqueous solutions into six classes based on frequency and impedance variations during the development process using quartz crystal microbalance (QCM) measurements. These classifications were examined against various material attributes via decision trees and support vector machine (SVM) models. The feature values included in this analysis comprised the length of alkyl chains, molecular weight, solute concentration, viscosity of developers, protection ratios, molar masses, contact angles, and surface free energy of polymer. Accuracy for the test dataset was approximately 0.80 and 0.75 for the decision trees and SVM, respectively, when validated.

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Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu "Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500J (21 November 2023); https://doi.org/10.1117/12.2687340

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