High-brightness and compact LPP EUV source for inspection system

Yasutsugu Usami; Yoshifumi Ueno; Shinji Nagai; Fumio Iwamoto; Takuya Ishii; Tsuyoshi Yamada; Hiroaki Nakarai

doi:10.1117/12.2686231

21 November 2023 High-brightness and compact LPP EUV source for inspection system

Yasutsugu Usami, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Takuya Ishii, Tsuyoshi Yamada, Hiroaki Nakarai

Author Affiliations +

Proceedings Volume 12751, Photomask Technology 2023; 1275116 (2023) https://doi.org/10.1117/12.2686231
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

With the full-scale adoption of EUV exposure tools, the use of Metrology and Inspection systems adapted for EUV process evaluation is increasing. In particular, with the increased durability of Pellicle, the importance of actinic Metrology and Inspection systems is increasing, and EUV light sources with high brightness and high availability are required. Gigaphoton Inc. has been developing laser-produced plasma (LPP) EUV light sources using Sn droplet technology for exposure tool since 2000. Based on this accumulated LPP EUV source technology, we have developed a High-brightness and compact LPP EUV source for Metrology and Inspection systems. This newly developed light source is a SoCoMo (Source Collector Module) EUV light source with a built-in reflective mirror based on customer specifications. In addition, it features stable operation and a one-year maintenance-free structure, contributing to longterm stable operation of the inspection equipment. Currently this EUV light source has demonstrated a brightness of 120W/mm2sr at the plasma point at a repetition frequency of 20kHz without any decrease in reflectivity of the EUV collector mirror after 500 hours of operation.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yasutsugu Usami, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Takuya Ishii, Tsuyoshi Yamada, and Hiroaki Nakarai "High-brightness and compact LPP EUV source for inspection system", Proc. SPIE 12751, Photomask Technology 2023, 1275116 (21 November 2023); https://doi.org/10.1117/12.2686231

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