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1 August 1990 Long-pulse x-ray preionized XeCl laser with double discharge and magnetic switching
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Proceedings Volume 1278, Excimer Lasers and Applications II; (1990)
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
High efficiency X-ray Preioized discharge XeCl laser e,citation has been achieved with a Ne/Xe/HCI mixture in a 50 cm" active volume (25*21 cm'), by combining double discharge technique (spiker/sustainer) with a new fast ferrite magnetic switch. A fast high voltage spiker pulse of low energy is applied across laser electrodes to initiate an uniform discharge. Peaking capacitors are set in a very low inductance configuration between electrodes. Main discharge is energized by a 200ns electrical time pulse charged double sided solid state PFL of much lower voltage which is automatically applied to electrodes through a low inductance path after magnetic switch saturation by the spiker.The magnetic switch is made of several coaxial structures in parallel, each of them comprising many high frequency Ni-Zn ferrite tores set in serie. This laser has a very high pulse rate frequency capability (> 1 KHz). An efficiency over 3% in energy and 4% in power at the maximum, with 110 mJ extracted optical energy in a 140 ns (FWHM) laser pulse length, has been demonstrated with this not optimized device.A parametric study of this laser is presented. At the end, planned further studies of the present advanced excitation system for conditions of very high PRF, in the frame of Eureka EU205 Eurolaser program, are presented. The experimental part of these planned studies would be made with LUX very high PRF high average power IMFM test-bed.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernard L. Fontaine, Jean-Marc Hueber, Philippe Ch. Delaporte, and Bernard M. Forestier "Long-pulse x-ray preionized XeCl laser with double discharge and magnetic switching", Proc. SPIE 1278, Excimer Lasers and Applications II, (1 August 1990);


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