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1 August 1990 ArF excimer laser photolysis of tetramethyltin Sn(CH3)4 probed by dye-laser-induced resonant multiphoton ionization
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Proceedings Volume 1279, Laser-Assisted Processing II; (1990)
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Laser-photolysis of tetramethyltin Sn(CH?)4 (TMT) is very interesting being this molecule an attractive precursor for laser photodeposition of Sn thin films. Efficient dissociation and ionization are obtained irradiating the organometallic with the ArF laser beam, being the energy of one photon at 193 nm resonant with the first TMT absorption band. At low laser radiation density, the observation of the Sn(CH3) dominating the mass spectrum shows that photolysis is initiated by the elimination of one methyl group. The relative abundance of lighter SnCH3 and Sn ions is strongly depending on the energy density. Neutral photoproducts of the 1Jv photolysis are sampled by dye-laser-induced resonant Multi-Photon Ionization (MPI); suitable wavelengths are identified through visible MPI in the 370-410 nm range. Furthermore neutral CH3 fragments are detected by ZR+l ionization induced at 333.5 nm. Varying the delay between the UV and the probing laser pulses, informations on the reaction dynamics are achieved. The presence of a strong dissociative channel evidenced by the two-colour ionization experiments demonstrates the suitability Qf TMT as metal precursor for ArF laser induced deposition of Sn and Sn-containing films.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stefano Fontana, E. Borsella, and R. Larciprete "ArF excimer laser photolysis of tetramethyltin Sn(CH3)4 probed by dye-laser-induced resonant multiphoton ionization", Proc. SPIE 1279, Laser-Assisted Processing II, (1 August 1990);


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