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1 August 1990Deposition of thin films by high-energy excimer laser ablation
The laser deposition of textured thin films was investigated for
different degrees of crystal complexity. At the target high laser
pulse energy density in a homogeneously illuminated spot is required
throughout for stoichiometric material transfer to the substrate. The
epitaxial growth is controlled by the substrate terrrperature within a
narrow range; the simple MgO structure does not need a crystalline
substrate. Fragments volatile in the ablation process may be supplied
from the background gas, as oxygen for YBaCuO. Some applications will
require large area deposition. This has been accomplished by greater
target-to-substrate distance without film deterioration, and by translational
motion through the plasma cone.
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K. Schmatjko, B. Roas, G. Endres, L. Schultz, "Deposition of thin films by high-energy excimer laser ablation," Proc. SPIE 1279, Laser-Assisted Processing II, (1 August 1990); https://doi.org/10.1117/12.20629