High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa; Yusuke Kakinuma; Yoshiaki Ogiso; Naoyuki Tanaka; Kazuo Mukawa; Soichi Shida; Shinichi Kojima; Toshimichi Iwai

doi:10.1117/12.2675545

5 October 2023 High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Author Affiliations +

Proceedings Volume 12802, 38th European Mask and Lithography Conference (EMLC 2023); 128020D (2023) https://doi.org/10.1117/12.2675545
Event: 38th European Mask and Lithography Conference, 2023, Dresden, Germany

Abstract

We have developed novel Design Based Metrology (DBM) technology which enables metrology engineers to utilize not only 2-dimensional metrology with high precision but also high number CPU cores to reduce calculation time. It is crucial to maximize efficiency of parallel processing with high number of CPU cores and reduce overhead. We designed new DBM software based on the concepts of our novel DBM technology and build the DBM PC Cluster system consisting of the software and the latest computer system which meets the concept. The DBM PC Cluster system processing performance shows greater than several thousand images per hour capacity. In this paper, we will report the evaluation results and scalability for future mask metrology.

Citation Download Citation

Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, and Toshimichi Iwai "High-performance computing architecture (HW/SW) for mask CDSEM design based metrology", Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020D (5 October 2023); https://doi.org/10.1117/12.2675545

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