CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 12802 > Article
Paper
5 October 2023 Divide et impera: a short talk about the importance of feature and model engineering
Jacob König-Otto, Stefan Meusemann
Author Affiliations +
Proceedings Volume 12802, 38th European Mask and Lithography Conference (EMLC 2023); 128020I (2023) https://doi.org/10.1117/12.2673254
Event: 38th European Mask and Lithography Conference, 2023, Dresden, Germany
Abstract
The Advanced Mask Technology Center (AMTC) is a joint venture of GlobalFoundries and Toppan Photomasks. AMTC delivers supreme quality photo masks for an enormous variety of different products. To compete with the constantly increasing quality requirements, data pre-processing becomes more and more a key component to reach required yield performances. To reach the quality requirements for the critical dimension (CD) of our masks we predict correction maps in order to improve CD uniformity and a process bias to improve CD mean to nominal (MTN). The process bias is defined as the difference of written structure size to the final structure dimensions on the completed mask. In this talk we present our path to our first machine learning based process bias model with an overall improvement of CD mean to nominal capability of around 30%. We take a closer look on model performance depending on the general model and feature design.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Jacob König-Otto and Stefan Meusemann "Divide et impera: a short talk about the importance of feature and model engineering", Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020I (5 October 2023); https://doi.org/10.1117/12.2673254
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 6 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Analytic models
Data modeling
Machine learning
Critical dimension metrology
Engineering
Photomasks
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top