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1 August 1990 Discussion of modulation mechanisms in electron-beam electroreflectance and comparison to alternative modulation techniques
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Proceedings Volume 1286, Modulation Spectroscopy; (1990) https://doi.org/10.1117/12.20835
Event: Advances in Semiconductors and Superconductors: Physics Toward Devices Applications, 1990, San Diego, CA, United States
Abstract
Electron Beam Electroreflectance (EBER), a low power-density form of cathodoreflectance, has been investigated for use in a wide variety of potential applications. Herein, we describe a phenomenological theory of EBER and provide experimental support for the inherent electroreflectance and thermoreflectance mechanisms. In addition to pair generation and heating proposed earlier, a new mechanism, electron charging of the surface, is identified from the 2f EBER signal of P-type semiconductors. Finally, we compare the potential advantages of EBER to those of photoreflectance.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael H. Herman "Discussion of modulation mechanisms in electron-beam electroreflectance and comparison to alternative modulation techniques", Proc. SPIE 1286, Modulation Spectroscopy, (1 August 1990); https://doi.org/10.1117/12.20835
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