Photoreflectance (PR) was used to determine the surface damage caused by polishing on
semi-insulating lnP:Fe substrates. PR measurements were performed between subsequent
etching steps. The PR results on substrates, obtained from various vendors and laboratories,
indicate that the exciton structure near the fundamental absorption edge transition is very
sensitive to surface imperfections and the bulk resistivity of the substrates.
Alok K. Berry,
D. Kurt Gaskill,
"Photoreflectance surface characterization of InP:Fe substrates", Proc. SPIE 1286, Modulation Spectroscopy, (1 August 1990); doi: 10.1117/12.20873; https://doi.org/10.1117/12.20873