Preparation of high Tc YBa2Cu3O7-x thin films

Mark S. DiIorio

doi:10.1117/12.20877

1 October 1990 Preparation of high Tc YBa2Cu3O7-x thin films

Mark S. DiIorio

Proceedings Volume 1287, High Tc Superconductivity: Thin Films and Applications; (1990) https://doi.org/10.1117/12.20877
Event: Advances in Semiconductors and Superconductors: Physics Toward Devices Applications, 1990, San Diego, CA, United States

Abstract

The various deposition processes for preparing high-T superconducting thin flints are compared. The focus is on both the key film properties produced by each technique as well as the advantages and disadvantages of the specific deposition process. Emphasis is placed on the issues relating to film manufacturability and consequently centers on the YBaCu3O7 superconductor. Innovative solutions allowing in-situ fabrication of thin films are also covered along with the leading post-anneal processes. The specific techniques examined include sputtering (single-target and multi-target), electron-beam co-evaporation, MBE, laser ablation, ion-beam deposition, and CVD.

Citation Download Citation

Mark S. DiIorio "Preparation of high Tc YBa2Cu3O7-x thin films", Proc. SPIE 1287, High Tc Superconductivity: Thin Films and Applications, (1 October 1990); https://doi.org/10.1117/12.20877

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