Present situation of research on stereophonic lithography using a pair of parabolic mirrors

Toshiyuki Horiuchi; Jun-ya Iwasaki; Hiroshi Kobayashi

doi:10.1117/12.2683770

29 September 2023 Present situation of research on stereophonic lithography using a pair of parabolic mirrors

Toshiyuki Horiuchi, Jun-ya Iwasaki, Hiroshi Kobayashi

Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150I (2023) https://doi.org/10.1117/12.2683770
Event: Photomask Japan 2023, 2023, Online Only

Abstract

As the present situation of stereophonic lithography using a pair of parabolic mirrors, a main subject of the research and challenges to solve it were discussed. Using a commercially available magic mirror system composed of a pair of parabolic mirrors, it was capable to make 3-dimensional real images of the original reflective objects placed on the lower mirror bottom at just above the upper mirror aperture. Utilizing this optics, and adding some ideas, stereophonic lithography on curved articles were enabled. At first, an aperture was opened at the bottom center of the lower mirror also. Next, transparent curved reticles were used instead of the original reflective objects. In addition, the transparent curved reticles were illuminated obliquely upward from the bottom using a collimated light from one side. Owing to these ideas, it was demonstrated that patterns on a curved spoon-shape reticles were successfully replicated on spoon-shape articles with the same shape. However, the reticles were made by pasting transparent seals with emulsion illustrations. Such reticles were not desirable from the view point of accuracy and exposure homogeneity. To solve this important subject, a new idea was contrived further. That was the replication from the conventional flat reticle to curved articles using the same parabolic mirror optics. Because the focal redundancy was very large, patterns were replicable, though light intensity distributed, pattern shapes were distorted, and pattern widths were also distributed. However, it was thought feasible to utilize flat reticles by compensating the light intensity distribution and image distortions.

Citation Download Citation

Toshiyuki Horiuchi, Jun-ya Iwasaki, and Hiroshi Kobayashi "Present situation of research on stereophonic lithography using a pair of parabolic mirrors", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150I (29 September 2023); https://doi.org/10.1117/12.2683770

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Reticles

Parabolic mirrors

Printing

Lithography

Light sources and illumination

Optical lithography

Structural health monitoring

Keywords/Phrases

Search In:

Publication Years