Approach to AI defect classification for photomask inspection equipment using EOI-AI software package developed by HTL

H. Hamada; K. Matsumura; A. R. Gupta; N. S. Das; A. Abu; H. Agarwal; S. Acharya; K. Egami; K. Nakanishi; S. Kanai; F. Yoshida; A. K. Acharya

doi:10.1117/12.2684573

29 September 2023 Approach to AI defect classification for photomask inspection equipment using EOI-AI software package developed by HTL

H. Hamada, K. Matsumura, A. R. Gupta, N. S. Das, A. Abu, H. Agarwal, S. Acharya, K. Egami, K. Nakanishi, S. Kanai, F. Yoshida, A. K. Acharya

Author Affiliations +

Proceedings Volume 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; 129150K (2023) https://doi.org/10.1117/12.2684573
Event: Photomask Japan 2023, 2023, Online Only

Abstract

The purpose of this trial is how an AI-based approach can contribute to improving the operability of photomask inspection equipment. It is important for the equipment operation how to efficiently identify photomask defects. In particular, it is essential to accurately perform the filtering of erroneous judgments of inspection equipment called false defects. Furthermore, for actual defects, it is necessary to classify the defect types as accurately as possible. This paper describes how to implement AI approach into the “Defect Review System”. Especially, in case that the equipment can capture both transmission and reflection images simultaneously, effective utilization of both images has been shown to result in more effective identification of defects.

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H. Hamada, K. Matsumura, A. R. Gupta, N. S. Das, A. Abu, H. Agarwal, S. Acharya, K. Egami, K. Nakanishi, S. Kanai, F. Yoshida, and A. K. Acharya "Approach to AI defect classification for photomask inspection equipment using EOI-AI software package developed by HTL", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150K (29 September 2023); https://doi.org/10.1117/12.2684573

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