CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 12953 > Article
Presentation + Paper
10 April 2024 Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Gerardo Bottiglieri, Tim Brunner, Eelco van Setten, Claire van Lare, Mark van de Kerkhof
Author Affiliations +
Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 1295302 (2024) https://doi.org/10.1117/12.3009996
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
The lithographic imaging performance of contact holes is limited by the efficient use of light and contrast fading caused by 3D mask effects. ”Split pupil” exposures have been proposed to mitigate contrast fading for line-space-patterns. We present a simulation study investigating the extendibility of split pupil exposures to dense arrays of contacts on dark field and light field masks using different mask absorber options. Our simulations indicate that the combination of split pupil exposures and low-n/low-k absorbers can offer comfortable imaging performance for arrays of 10 nm square contacts with a pitch of 20 nm on a dark field mask. These results indicate the potential of combining low-n absorbers and split pupil exposure strategies to enable high-NA EUV lithography to reach its ultimate optical resolution limits.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Gerardo Bottiglieri, Tim Brunner, Eelco van Setten, Claire van Lare, and Mark van de Kerkhof "Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 1295302 (10 April 2024); https://doi.org/10.1117/12.3009996
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 14 PAGES + PRESENTATION
DOWNLOAD PAPER SAVE TO MY LIBRARY
WATCH
PRESENTATION
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks
Light sources and illumination
Lithography
Source mask optimization
Near field
Diffraction
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top