Presentation + Paper
10 April 2024 Investigation of die-cost scaling scenarios in future technologies
Author Affiliations +
Abstract
The concurrent saturation in dimensional scaling and increase in manufacturing cost and complexity has caused the overall semiconductor manufacturing cost to significantly increase. As a result, the cost per transistor is predicted to sharply increase in future technologies, deviating from the typical 30% cost per transistor reduction. This work explores the use of 3D-integration technologies, as wafer-to-wafer hybrid bonding, for both mobile and high-performance application. It is observed that the use of 3D-integration schemes, can reduce the overall die cost at same functionality, paving the way for cost-effective scaling solutions in future technologies.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
G. Mirabelli, Y.-P. Tsai, Y.-H. Chang, D. Velenis, R.-H. Kim, J. Myers, L.-Å. Ragnarsson, O. Zografos, and G. Hellings "Investigation of die-cost scaling scenarios in future technologies", Proc. SPIE 12954, DTCO and Computational Patterning III, 129540E (10 April 2024); https://doi.org/10.1117/12.3010149
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Back end of line

Front end of line

Logic

Semiconductor manufacturing

Back to Top