CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 12954 > Article
Presentation + Paper
10 April 2024 Source mask optimization (SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
Soobin Hwang, Werner Gillijns, Stefan de Gendt, Ryoung-han Kim
Author Affiliations +
Proceedings Volume 12954, DTCO and Computational Patterning III; 129540X (2024) https://doi.org/10.1117/12.3010869
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
High numerical aperture (NA) extreme ultraviolet (EUV) lithography single patterning is evaluated through source mask optimization (SMO). The patterning performance is assessed on random logic metal design with minimum pitches of 24, 22, and 20nm in the horizontal direction to confirm the feasibility of logic metal scaling. We set a 1 square micron as a cell window and choose 200 gauges to include various types of features such as dense, isolated, and tip-to-tip. SMO is performed assuming eight permutations of a) dark-field versus bright-field, b) Ta-based versus low-n attenuated phaseshift masks, and c) with sub-resolution assist feature (SRAF) versus without SRAF. For each design, the process window is estimated.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Soobin Hwang, Werner Gillijns, Stefan de Gendt, and Ryoung-han Kim "Source mask optimization (SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal", Proc. SPIE 12954, DTCO and Computational Patterning III, 129540X (10 April 2024); https://doi.org/10.1117/12.3010869
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 9 PAGES + PRESENTATION
DOWNLOAD PAPER SAVE TO MY LIBRARY
WATCH
PRESENTATION
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
SRAF
Photomasks
Source mask optimization
Optical lithography
Logic
Extreme ultraviolet lithography
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top