Dissolution dynamics of copolymer of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige; Yuko Tsutsui Ito; Takahiro Kozawa; Kazuo Sakamoto; Makoto Muramatsu

doi:10.1117/12.3011199

9 April 2024 Dissolution dynamics of copolymer of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Author Affiliations +

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129570D (2024) https://doi.org/10.1117/12.3011199
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

For the advancement of lithography, the resist materials and processes are the most critical issue in the microfabrication of semiconductors. Especially in the sub-20nm half pitch resolution region, the development process of resist materials is of particular importance from the viewpoint of reducing the line width roughness (LWR) and stochastic defects. In this study, a quartz crystal microbalance (QCM) method was used to investigate the dissolution dynamics of poly(4-hydroxystyrene-co-methacrylic acid) (PHSMA) films in tetraalkylammonium hydroxide aqueous solutions. The PHSMA film showed a characteristic dissolution kinetics in tetraalkylammonium hydroxide aqueous solutions, which was not observed for poly(4-hydroxystyrene) film.

Conference Presentation

Citation Download Citation

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu "Dissolution dynamics of copolymer of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129570D (9 April 2024); https://doi.org/10.1117/12.3011199

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