PFAS-free I-line strong photoacid generator for positive-tone and negative-tone thick-film photoresists

Hung-Yang Chen; Ionela-Daniela Carja; Chunwei Chen; Ashley Moore; Philipp Hans Fackler; Ralph Dammel

doi:10.1117/12.3009506

9 April 2024 PFAS-free I-line strong photoacid generator for positive-tone and negative-tone thick-film photoresists

Hung-Yang Chen, Ionela-Daniela Carja, Chunwei Chen, Ashley Moore, Philipp Hans Fackler, Ralph Dammel

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571H (2024) https://doi.org/10.1117/12.3009506
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

In this study, we present the development of PFAS-free AZ^® FZero 3DT positive photoresist and AZ^® FZero NX-3015 negative photoresist. These novel photoresists were enabled by the utilization of a newly developed PFAS-free M PAG (photoacid generator). Both AZ^® FZero 3DT and AZ^® FZero NX-3015 photoresists have exhibited comparable lithography performance to their PFAS-containing comparative examples on both Silicon (Si) and Copper (Cu) substrates. Furthermore, the newly developed PFAS-free M PAG has displayed good stability on Cu substrates, outperforming the commercial oxime sulfonate PAG. This stability is particularly crucial for the successful application of photoresists in the fabrication of re-distribution layers (RDL) in advanced semiconductor packaging.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Hung-Yang Chen, Ionela-Daniela Carja, Chunwei Chen, Ashley Moore, Philipp Hans Fackler, and Ralph Dammel "PFAS-free I-line strong photoacid generator for positive-tone and negative-tone thick-film photoresists", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571H (9 April 2024); https://doi.org/10.1117/12.3009506

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