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9 April 2024 Impact of increasing EUV absorption of CAR polymers on lithographic performance
Yinjie Cen, Emad Aqad, Li Cui, Suzanne M. Coley, Jong Keun Park, Benjamin D. Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo
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Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571Z (2024) https://doi.org/10.1117/12.3010961
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Chemically amplified resists (CAR) enable the transition of extreme ultraviolet (EUV) lithography to high-volume manufacture (HVM). Novel photoresists continue to be designed to meet the simultaneous improvement of resolution, line width roughness, and sensitivity (RLS) trade-off. The absorption of EUV photons in the photoresist film leads to emission of primary electrons to form secondary electrons by inelastic scattering events which in turn leads to the activation of the photoacid generator compound. A unique challenge for the use of CAR in EUV lithography is their poor absorption at 13.5nm wavelength. Understanding the photoresist EUV absorption impact on lithographic performance parameters is critical for photoresist design. In this study, we designed photoresist polymers with tuned EUV absorption coefficients by incorporating EUV absorption group(s) onto different CAR polymers. The effect of the EUV absorption increase on polymer properties as well as on resist lithographic performance will be presented.
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Yinjie Cen, Emad Aqad, Li Cui, Suzanne M. Coley, Jong Keun Park, Benjamin D. Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, and Karen Petrillo "Impact of increasing EUV absorption of CAR polymers on lithographic performance", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571Z (9 April 2024); https://doi.org/10.1117/12.3010961
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KEYWORDS
Polymers
Extreme ultraviolet
Absorption
Extreme ultraviolet lithography
Photoresist materials
Line width roughness
Lithography
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