1 October 1990 Characteristics and applications of advanced technology microchannel plates
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Abstract
A method for fabrication of novel thin-filrn continuous dynode electron multipliers is described. We have shown the feasibility of crucial manufacturing steps, including anisotropic dry etching of substrates into photolithographically-defined arrays of high-aspect-ratio channels, and the formation of thin-film continuous dynodes by chemical vapor deposition. We discuss potential performance and design advantages of this advanced technology microchannel plate (AT-MCP) over the conven tional reduced lead silicate glass inicrochannel plate (RLSG-'MCP) and implications for new applications.
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Jerry R. Horton, Jerry R. Horton, G. William Tasker, G. William Tasker, John J. Fijol, John J. Fijol, } "Characteristics and applications of advanced technology microchannel plates", Proc. SPIE 1306, Sensor Fusion III, (1 October 1990); doi: 10.1117/12.21634; https://doi.org/10.1117/12.21634
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