1 October 1990 Characteristics and applications of advanced technology microchannel plates
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A method for fabrication of novel thin-filrn continuous dynode electron multipliers is described. We have shown the feasibility of crucial manufacturing steps, including anisotropic dry etching of substrates into photolithographically-defined arrays of high-aspect-ratio channels, and the formation of thin-film continuous dynodes by chemical vapor deposition. We discuss potential performance and design advantages of this advanced technology microchannel plate (AT-MCP) over the conven tional reduced lead silicate glass inicrochannel plate (RLSG-'MCP) and implications for new applications.
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Jerry R. Horton, Jerry R. Horton, G. William Tasker, G. William Tasker, John J. Fijol, John J. Fijol, "Characteristics and applications of advanced technology microchannel plates", Proc. SPIE 1306, Sensor Fusion III, (1 October 1990); doi: 10.1117/12.21634; https://doi.org/10.1117/12.21634

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