Paper
18 March 2024 Research on high precision and large range automatic focusing method for digital lithography
Author Affiliations +
Proceedings Volume 13104, Advanced Fiber Laser Conference (AFL2023); 131041N (2024) https://doi.org/10.1117/12.3022592
Event: Advanced Fiber Laser Conference (AFL2023), 2023, Shenzhen, China
Abstract
At present, the resolution of digital lithography based on digital micromirror devices is constantly improving. The assembly and debugging of traditional autofocusing devices are complicated, and the focus detection precision and range are difficult to meet the requirements of high precision digital lithography. Therefore, it has become an important research topic to explore the matching digital lithography autofocusing method. In this paper, a set of high resolution digital lithography system is established, which integrates digital lithography autofocus algorithm with variable step size peak search autofocus algorithm. Various common image sharpness evaluation functions and objectives at a variety of magnifications are used to realize the autofocus algorithm, and the performance of the image sharpness function is analyzed comprehensively. The experimental results show that by using algorithm fused with the autofocusing device in this paper, focus detection ranges of 10x, 20x and 40x objective lenses can reach 280μm, 160μm and 105μm, respectively, and the autofocusing accuracy can reach 0.625μm, achieving the submicron precision and large range autofocus at various magnifications. The experimental results of this paper can provide important reference value for autofocus of submicron scale digital lithography.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Yue Liu, Ningning Luo, Zhangrui Chen, Shuai Deng, and Jiaqing Deng "Research on high precision and large range automatic focusing method for digital lithography", Proc. SPIE 13104, Advanced Fiber Laser Conference (AFL2023), 131041N (18 March 2024); https://doi.org/10.1117/12.3022592
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lithography

Image sharpness

Image processing

Lenses

Digital micromirror devices

Digital imaging

Information science

RELATED CONTENT

The next generation of maskless lithography
Proceedings of SPIE (March 15 2016)
Imaging simulation of maskless lithography using a DMD
Proceedings of SPIE (January 27 2005)
Development of MOEMS technology in maskless lithography
Proceedings of SPIE (February 13 2009)
Design of maskless lithography system based on DMD
Proceedings of SPIE (January 04 2008)

Back to Top