1 December 1990 Electron-rain-assisted deposition of optical thin films
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A hollow cathode electron/ion source with permanent-magnet-field was introduced to assist depositing oxidemetal optical coatings. The refractive index ,absoption and scatter of as -deposited layers arediscussed. It wasfound that the optical loss (absoption and scatter) decreased under proper depositing conditions. The optirnumevaporating parameters were obtained through orthogonal experiments.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jiu Lin Zhou, Jiu Lin Zhou, Zi Ma, Zi Ma, Qian Ru Liu, Qian Ru Liu, } "Electron-rain-assisted deposition of optical thin films", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); doi: 10.1117/12.22373; https://doi.org/10.1117/12.22373

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