1 December 1990 Method of monitoring nonquarter-wavelength film thickness by turning point
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Abstract
A method is presented for nionitoring Taultilayer structures with nonquarter wavelength thickness. This method is similar to the conventional turning point method, except that the irronitoring wavelength selected by adniittance diagram will be changed with layers. Results are given for the use of this method in depositing Antireflectance coatings (ARC.)
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anmin Zheng, Anmin Zheng, Yixun Yan, Yixun Yan, Fengshan Zhang, Fengshan Zhang, } "Method of monitoring nonquarter-wavelength film thickness by turning point", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); doi: 10.1117/12.22406; https://doi.org/10.1117/12.22406
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