1 December 1990 Effects of surface diffusion on thin-film morphology: a computer study
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Abstract
A two-dimensional hard-disk model of thin-film deposition is described; the model is of the type originally introduced by Henderson et al.1 We have implemented a simple (and necessarily approximate) way to incorporate the effects of surface diffusion in our model, and a means to connect the input parameters of the computer algorithm to the evaporation parameters of substrate temperature and evaporation rate. The effects of surface diffusion and vapor-incidence angle on film structure are explored; the effects of surface diffusion predicted by the model correlate with the transition in film structure (Zone 1 to Zone 2) first described by Movchan and Demchishin.2
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert B. Sargent, "Effects of surface diffusion on thin-film morphology: a computer study", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); doi: 10.1117/12.22412; https://doi.org/10.1117/12.22412
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