Effects of surface diffusion on thin-film morphology: a computer study

Robert B. Sargent

doi:10.1117/12.22412

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1 December 1990 Effects of surface diffusion on thin-film morphology: a computer study

Robert B. Sargent

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Proceedings Volume 1324, Modeling of Optical Thin Films II; (1990) https://doi.org/10.1117/12.22412
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A two-dimensional hard-disk model of thin-film deposition is described; the model is of the type originally introduced by Henderson et al.1 We have implemented a simple (and necessarily approximate) way to incorporate the effects of surface diffusion in our model, and a means to connect the input parameters of the computer algorithm to the evaporation parameters of substrate temperature and evaporation rate. The effects of surface diffusion and vapor-incidence angle on film structure are explored; the effects of surface diffusion predicted by the model correlate with the transition in film structure (Zone 1 to Zone 2) first described by Movchan and Demchishin.2

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Robert B. Sargent "Effects of surface diffusion on thin-film morphology: a computer study", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); https://doi.org/10.1117/12.22412

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