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1 December 1990 Characterization of microwave plasma CVD of diamond by mass analysis and optical emission spectroscopy
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Abstract
A microwave plasma enhanced chemical vapor deposition system is characterized using optical emission spectroscopy and mass spectrometry. CH4 CH2 CH4 and CO were used as carbon source gases. The effects of 02 addition to the feed gas is examined. Emission from CH in the plasma is observed and CH4 is a stable reaction product for all carbon source gases used. 02 is fully consumed and converted to H20 and CO. Emission from C is observed for all hydrocarbon gases when 02 is added but is absent when CO is the carbon source gas. Addition of 02 also dramatically affects the relative amount of reaction products as the carbon in the system is converted to CO. 1.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wayne A. Weimer and Curtis E. Johnson "Characterization of microwave plasma CVD of diamond by mass analysis and optical emission spectroscopy", Proc. SPIE 1325, Diamond Optics III, (1 December 1990); https://doi.org/10.1117/12.22447
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