1 December 1990 Diamond membranes for x-ray lithography
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Diamond membranes are being developed for x-ray lithography masks. Typically these 1-3 im thick membrane films are deposited on Si substrates using microwave driven plasmas. To obtain smooth films with uniform tensile stress spray and electrophoretic deposition of 0. 1 zm diamond seeds were used to control the initial nucleation and growth of the diamond films. The films have a room ternperature tensile stress of 25-125 MPa. The temperature dependence of the stress is due to the tensile growth stress of the diamond film and the thermal stress of the diamond-Si layer structure. The films have a biaxial modulus of 800 GPa. X-ray lithography masks have been made and used to print patterns with x-rays from a synchrotron source. 1 .
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charles R. Guarnieri, Charles R. Guarnieri, Jerome J. Cuomo, Jerome J. Cuomo, S. J. Whitehair, S. J. Whitehair, B. S. Berry, B. S. Berry, W. C. Pritchet, W. C. Pritchet, Raul E. Acosta, Raul E. Acosta, Alan D. Wilson, Alan D. Wilson, } "Diamond membranes for x-ray lithography", Proc. SPIE 1325, Diamond Optics III, (1 December 1990); doi: 10.1117/12.22471; https://doi.org/10.1117/12.22471

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