1 November 1990 New screening methodology to select low outgassing materials for cold, spaceborne optical instruments
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Based on 1) experience gained from material outgassing tests and evaluation of the Wide Field Planetary Camera (WFPC) instrument and 2) consideration for cost/schedule impacts related to performing and utilizing the results of outgassing tests a set of new standard outgassing methods is proposed for screening materials considered for use in space instruments with cooled sensors/optics/detectors. The existing outgassing standard ASTM E-595 is inadequate and inappropriate for selecting materials to be used in and around optics that are cooler than about 20 C. This paper describes some of the background assumptions caveats observations and facts that have led us to propose a set of specific test protocols. The sensitivity of any given spaceborne optical instrument to molecular contamination is obviously a function of many variables. With instruments of varying sensor/optics/detector temperatures how can one hope to standardize material outgas screening? Related to this issues of test/data conservativeness and compromise will be briefly described. Materials and processes issues such as vacuum bakeouts and diffusion as related to molecular outgassing are described. In addition a few material outgassing test results will be presented for a variety of test conditions. Selected results from JPL multiple Quartz Crystal Microbalance (QCM) testing are summarized. Standardization of more applicable and stringent outgassing tests than covered by ASTM E- 595 will go a long way toward improving the performance quality and reliability of future optical flight hardware. We
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy P. O'Donnell, Timothy P. O'Donnell, Daniel M. Taylor, Daniel M. Taylor, Jack B. Barengoltz, Jack B. Barengoltz, } "New screening methodology to select low outgassing materials for cold, spaceborne optical instruments", Proc. SPIE 1329, Optical System Contamination: Effects, Measurement, Control II, (1 November 1990); doi: 10.1117/12.22610; https://doi.org/10.1117/12.22610


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