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1 January 1991 Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances
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Abstract
A new technique to obtain the refractive index and thickness of a thin film simultaneously is presented. The reflectances of p polarized light and s polarized light are measured at various angles of incidence, and by a numerical procedure, the film index and thickness are extracted from the measured reflectances. The measurement and numerical procedure to determine the film index and thickness are simple and the obtained values are accurate. As an example, we made measurements on a single layer film (SiOJSi) and a double layer film (SiON/Si02/Si), and confirmed the obtained values were consistent.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tami Kihara and Kiyoshi Yokomori "Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances", Proc. SPIE 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection, (1 January 1991); https://doi.org/10.1117/12.51136
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