1 November 1990 Complex investigations of the photoresist layer's formation in microlithography
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Abstract
Creation of the elements with minimum 1 i near dimensions demands of the presence of definite knowledges about photoresist's behavior dunngal 1 technological process and about any element of the equipment and it's influence on photoresist 1 ayer.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander G. Shapiro, "Complex investigations of the photoresist layer's formation in microlithography", Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); doi: 10.1117/12.22854; https://doi.org/10.1117/12.22854
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