1 November 1990 Complex investigations of the photoresist layer's formation in microlithography
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Abstract
Creation of the elements with minimum 1 i near dimensions demands of the presence of definite knowledges about photoresist's behavior dunngal 1 technological process and about any element of the equipment and it's influence on photoresist 1 ayer.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander G. Shapiro, Alexander G. Shapiro, } "Complex investigations of the photoresist layer's formation in microlithography", Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); doi: 10.1117/12.22854; https://doi.org/10.1117/12.22854
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