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1 November 1990 New process for manufacturing arrays of microlenses on various substrates
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The need for microlenses with a wide-range of focal lengths from 1O to 100mm and with a diameter varying from 1Oi to 1mm lead to the development of various techniques which are able to generate these lenses in a photoresist substrate or in special glasses . The existing techniques are reviewed and a new one proposed. In this technique a positive or negative photoresist layer is exposed to a tailored light intensity distribution. After development of the photoresist, its surface is identical to the spatial intensity light distribution. Photoresist with an index of refraction of n=1.6 in the visible spectrum, can be used as a lens. Furthermore this surface can be transferred to substrate like glass, silicon germanium etc., by etching techniques.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marc Abitbol and Naftali Paul Eisenberg "New process for manufacturing arrays of microlenses on various substrates", Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990);

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