1 November 1990 New process for manufacturing arrays of microlenses on various substrates
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The need for microlenses with a wide-range of focal lengths from 1O to 100mm and with a diameter varying from 1Oi to 1mm lead to the development of various techniques which are able to generate these lenses in a photoresist substrate or in special glasses . The existing techniques are reviewed and a new one proposed. In this technique a positive or negative photoresist layer is exposed to a tailored light intensity distribution. After development of the photoresist, its surface is identical to the spatial intensity light distribution. Photoresist with an index of refraction of n=1.6 in the visible spectrum, can be used as a lens. Furthermore this surface can be transferred to substrate like glass, silicon germanium etc., by etching techniques.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marc Abitbol, Marc Abitbol, Naftali Paul Eisenberg, Naftali Paul Eisenberg, } "New process for manufacturing arrays of microlenses on various substrates", Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); doi: 10.1117/12.22857; https://doi.org/10.1117/12.22857

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