Fabrication and characterization of Si-based soft x-ray mirrors

Bernt Schmiedeskamp; Bernhard Heidemann; Ulf Kleineberg; Andreas Kloidt; Mikhael Kuehne; H. Mueller; Peter Mueller; Kerstin Nolting; Ulrich Heinzmann

doi:10.1117/12.23179

1 February 1991 Fabrication and characterization of Si-based soft x-ray mirrors

Bernt Schmiedeskamp, Bernhard Heidemann, Ulf Kleineberg, Andreas Kloidt, Mikhael Kuehne, H. Mueller, Peter Mueller, Kerstin Nolting, Ulrich Heinzmann

Author Affiliations +

Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23179
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

The fabrication, by electron beam evaporation, of Mo/Si and Ta/Si mutilayers designed as soft-X-ray mirrors is described. The mirrors were characterized using surface analytical methods (RBS and sputtering in combination with AES), Cu-k(alpha) reflection, and soft-X-ray optical methods, and their soft-X-ray optical properties were correlated with microstructural characteristics. A comparison of in situ C-k reflectivity curves with calculations disclosed the existence of roughnesses at the interfaces, which can not be completely described by multiplying the reflected amplitude at each interface by a Debye-Waller factor. It was found that heating of Ta/Si samples induces a considerable change (up to and above 10 percent) in the d-spacing of multilayers, while the reflected amplitude is only reduced to two thirds of its original value.

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Bernt Schmiedeskamp, Bernhard Heidemann, Ulf Kleineberg, Andreas Kloidt, Mikhael Kuehne, H. Mueller, Peter Mueller, Kerstin Nolting, and Ulrich Heinzmann "Fabrication and characterization of Si-based soft x-ray mirrors", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23179

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