1 January 1991 Soft and hard x-ray reflectivities of multilayers fabricated by alternating-material sputter deposition
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Abstract
Large area Mo/Si and W/Si multilayers used as Bragg reflectors for synchrotron radiation in soft and hard x-ray regions are fabricated using a newly developed alternating-material sputter deposition on 4-inch diameter substrates. Measurements using a surface profiler show a thickness uniformity of better than 1 deviation over the whole area of 4-inch diameter substrate. The reflectivity of the multilayers for CuKa radiation agrees well with theoretical calculations which include film surface roughness and interfacial roughness. The soft x-ray reflectivity measuring system consisting of the plane grating monochrometer and the reflectometer was developed. The Mo/Si multilayers consisting of 30 pairs of 2. 7-nm thick molybdenum and 4-nm thick silicon layers has been showed a peak reflectivity of 46 and a full-width at half-maximum value of 0. 56 nm at a wavelength of 13 nm. A double monochromators using this Mo/Si multilayer has a peak reflectivity of 19 and full-width at half-maximum value of 0. 37 nm at the same wavelength. W/Si multilayers consisting of 200 pairs of 1. 4-nm thick tungsten and 2. 9-nm thick silicon layers show a peak reflectivity of 8. 5 at a 2. 5-nm wavelength. These results show that high-quality multilayers for Bragg reflectors for synchrotron radiation can be fabricated by alternating-material sputter deposition. 1.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hisataka Takenaka, Hisataka Takenaka, Yoshikazu Ishii, Yoshikazu Ishii, Hiroo Kinoshita, Hiroo Kinoshita, Kenji Kurihara, Kenji Kurihara, } "Soft and hard x-ray reflectivities of multilayers fabricated by alternating-material sputter deposition", Proc. SPIE 1345, Advanced X-Ray/EUV Radiation Sources and Applications, (1 January 1991); doi: 10.1117/12.23324; https://doi.org/10.1117/12.23324
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