Adhesion Of Chromium Films To Various Glasses Used In Photomasks

Yuji Nakajima; Tetsuro lzumitani; Yasuo Fukuoka

doi:10.1117/12.956127

6 September 1978 Adhesion Of Chromium Films To Various Glasses Used In Photomasks

Yuji Nakajima, Tetsuro lzumitani, Yasuo Fukuoka

Proceedings Volume 0135, Developments in Semiconductor Microlithography III; (1978) https://doi.org/10.1117/12.956127
Event: Developments in Semiconductor Microlithography III, 1978, San Jose, United States

Abstract

The adhesion of chromium films to various glass substrates has been studied in various glass composition. 16 types of glasses were prepared by substituting B₂O₃ for SiO₂, Al₂0₃ for CaO, and RO and R₂O for CaO respectively in an almino-silicate glass. The adhesion of chromium films is evaluated by the so-called "scratch test" and observation of pinholes generated by ultrasonic agitation. It was found that a) with increased content of B₂O₃, pinhole density, ρ, increased and critical load W_c, at which film was stripped from substrate by scratching, decreased, b) with substitution of RO for CaO, ρ became larger in the order of CaO < MgO, ZnO < SrO, BaO, PbO, and W_c decreased in the order of MgO > CaO > ZnO > SrO, BaO, PbO, c) with R₂O₃ substitution, ρ decreased in the order of K₂O, Na₂O, Li₂O. Thus, it is clear that B₂O₃, BaO, SrO, PbO, K₂O and Na₂O in glass contribute to poor adhesion of chromium films. It was also fauna that HOYA LE-30 glass had excellent adhesion to exceed an ordinary alumino-boro-silicate glass.

Citation Download Citation

Yuji Nakajima, Tetsuro lzumitani, and Yasuo Fukuoka "Adhesion Of Chromium Films To Various Glasses Used In Photomasks", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); https://doi.org/10.1117/12.956127

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