1 October 1990 Spatial characteristics of laser pulsed plasma deposition of thin films
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Proceedings Volume 1352, 1st Intl School on Laser Surface Microprocessing; (1990) https://doi.org/10.1117/12.23734
Event: International School on Laser Surface Microprocessing, 1989, Tashkent, Uzbekistan
Abstract
Lately a new film deposition technique — pulsed lase19 plasma vapour deposition (LPVD) — has been rather actively studied One of the main macroscopic features of any thin film deposition technique is distribution of film material on substrate. But this aspect of LPVD technique has been given a little attention. This paper discusses thickness profiles of the films deposited on the substrates by excimer laser plasma vapour deposition (ELPVD). Suggestions have been made concerning improvement of uniformity of the films thickness. Amorphous carbon films obtained by ELPVD technique can be used as protection and anti—reflection coatings for IR optics elements.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. A. Gorbunov, A. A. Gorbunov, Vitali I. Konov, Vitali I. Konov, } "Spatial characteristics of laser pulsed plasma deposition of thin films", Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); doi: 10.1117/12.23734; https://doi.org/10.1117/12.23734
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