1 January 1991 Design of reflective relay for soft x-ray lithography
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Proceedings Volume 1354, 1990 Intl Lens Design Conf; (1991); doi: 10.1117/12.47916
Event: 1990 International Lens Design Conference, 1990, Monterey, CA, United States
Abstract
An all-reflective unobscured flat-field low-distortion telecentric optical design has been developed for non-scanning reduction soft x-ray lithography application. 1. 0
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Michael Rodgers, Tanya E. Jewell, "Design of reflective relay for soft x-ray lithography", Proc. SPIE 1354, 1990 Intl Lens Design Conf, (1 January 1991); doi: 10.1117/12.47916; https://doi.org/10.1117/12.47916
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KEYWORDS
Mirrors

Distortion

X-ray lithography

Reflectivity

Wavefronts

Tolerancing

Modulation transfer functions

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