1 March 1991 Application of epitaxial lift-off to optoelectronic material studies
Author Affiliations +
Work in progress and completed studies in epitaxial liftoff by a number of workers in these Laboratories are reviewed. The areas include waxless chemical release on patterned substrates the liftoff of optical filters and of optical modulators for potential integration with silicon and the regrowth of unstrained films of arbitrary lattice constant on strained MBE grown InGaAs layers which have been chemically released from the underlying substrate. An extremely strong excitonic absorption has been discovered in 1pm GaAs liftoff films and strain measurements on these films have given hydrostatic and uniaxial deformation potentials.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Garth L. Price, Garth L. Price, Brian F. Usher, Brian F. Usher, } "Application of epitaxial lift-off to optoelectronic material studies", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); doi: 10.1117/12.24417; https://doi.org/10.1117/12.24417

Back to Top