Novel optoelectronic devices and integrated circuits using epitaxial lift-off

Piet M. A. Demeester; Ivan K.A. Pollentier; Luc Buydens; Peter Van Daele

doi:10.1117/12.24326

1 March 1991 Novel optoelectronic devices and integrated circuits using epitaxial lift-off

Piet M. A. Demeester, Ivan K.A. Pollentier, Luc Buydens, Peter Van Daele

Proceedings Volume 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization; (1991) https://doi.org/10.1117/12.24326
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany

Abstract

Epitaxial Lift-Off is a technology where a thin epitaxial film is removed from its substrate an grafted to another substrate. The problems encountered during this process will be described and an overview will be given of the devices and integrated circuits realised with this technique.

Citation Download Citation

Piet M. A. Demeester, Ivan K.A. Pollentier, Luc Buydens, and Peter Van Daele "Novel optoelectronic devices and integrated circuits using epitaxial lift-off", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); https://doi.org/10.1117/12.24326

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