Thin films of YBaCuO for electronic applications

Joseph M. Baixeras; Ferechteh Hosseini Teherani; Alain J. Kreisler; Alain Straboni; Kathy Barla

doi:10.1117/12.24449

1 February 1991 Thin films of YBaCuO for electronic applications

Joseph M. Baixeras, Ferechteh Hosseini Teherani, Alain J. Kreisler, Alain Straboni, Kathy Barla

Proceedings Volume 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications; (1991) https://doi.org/10.1117/12.24449
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany

Abstract

An overview of applications of YBaCuO thin films is presented emphasizing the RF properties of these high-Tc superconductors and microelectronics uses with silicon-based substrates. The substrates considered include the MOS dielectrics SiO2 and Si3N4, and a low-temperature deposition processing technique for these films followed by post-annealing is detailed. The time of the rapid thermal annealing following film processing is shown to dictate the electrical and structural characteristics of the films. Rapid thermal annealing is shown to be an effective method for manufacturing superconducting films of silicon substrates, although several cycles of the process can block all superconducting properties. The use of alternative buffer layers is considered as a means for protecting against this effect in superconductors composed of silica on silicon nitride.

Citation Download Citation

Joseph M. Baixeras, Ferechteh Hosseini Teherani, Alain J. Kreisler, Alain Straboni, and Kathy Barla "Thin films of YBaCuO for electronic applications", Proc. SPIE 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications, (1 February 1991); https://doi.org/10.1117/12.24449

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