1 February 1991 Silica optical integrated devices
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Proceedings Volume 1374, Integrated Optics and Optoelectronics II; (1991) https://doi.org/10.1117/12.24984
Event: SPIE Microelectronic Interconnect and Integrated Processing Symposium, 1990, San Jose, United States
Abstract
Silica waveguide integrated technologies have been developed based on a combination of the flame hydrolysis deposition and reactive ion etching which have the advantage of structure controllability and reproducibility. In addition we have developed the hybrid integration of passive components and packaging technology using Yttrium Aluminum Garnet (YAG) laser welding and simple adhesives. Silica optical integrated devices such as lxN splitters wavelength division multiplex/demultiplex (WDM) modules ring resonators Mach-Zehnder interferometers and optical switching devices can be commercially produced with these technologies.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Soichi Kobayashi, Soichi Kobayashi, Shin S. Sumida, Shin S. Sumida, Tadashi M. Miyashita, Tadashi M. Miyashita, } "Silica optical integrated devices", Proc. SPIE 1374, Integrated Optics and Optoelectronics II, (1 February 1991); doi: 10.1117/12.24984; https://doi.org/10.1117/12.24984
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